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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Accuracy of new analytical models for resist formation lithography
Malov, Juriy, Kalus, Christian K., Muellerke, Henning, Schmoeller, Thomas, Wildfeuer, Robert, Yen, AnthonyVolume:
4691
Year:
2002
Language:
english
DOI:
10.1117/12.474506
File:
PDF, 826 KB
english, 2002