SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Creation of low-molecular-weight organic resists for nanometer lithography
Kadota, Toshiaki, Yoshiiwa, Motoko, Kageyama, Hiroshi, Wakaya, Fujio, Gamo, Kenji, Shirota, Yasuhiko, Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436812
File:
PDF, 317 KB
english, 2001