Laser-produced plasma versus laser-assisted discharge plasma: physics and technology of extreme ultraviolet lithography light sources
Schriever, Guido, Semprez, Olivier, Jonkers, Jeroen, Yoshioka, Masaki, Apetz, RolfVolume:
11
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.11.2.021104
Date:
May, 2012
File:
PDF, 1.74 MB
english, 2012