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Selective etching of n-type silicon in pn junction structure in hydrofluoric acid and its application in silicon nanowire fabrication
Wang, Huiquan, Jin, Zhonghe, Zheng, Yangming, Ma, Huilian, Li, Tie, Wang, YuelinVolume:
19
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/19/17/175307
Date:
April, 2008
File:
PDF, 380 KB
english, 2008