Chemical Modification of Colloidal Masks for Nanolithography
Vossen, Dirk L. J., Penninkhof, Joan J., van Blaaderen, AlfonsVolume:
24
Language:
english
Journal:
Langmuir
DOI:
10.1021/la703847p
Date:
June, 2008
File:
PDF, 345 KB
english, 2008