SPIE Proceedings [SPIE 29th European Mask and Lithography Conference - Dresden, Germany (Tuesday 25 June 2013)] 29th European Mask and Lithography Conference - Dose variation and charging due to fogging in electron beam lithography: simulations using CHARIOT Monte Carlo software
Babin, Sergey, Borisov, Sergey, Patyukova, Elena, Behringer, Uwe F. W., Maurer, WilhelmVolume:
8886
Year:
2013
Language:
english
DOI:
10.1117/12.2032414
File:
PDF, 619 KB
english, 2013