Tensile stress generation and dislocation reduction in...

Journal of Applied Physics 2009 Vol. 106; Iss. 2

Tensile stress generation and dislocation reduction in Si-doped Al[sub x]Ga[sub 1−x]N films

Manning, I. C., Weng, X., Acord, J. D., Fanton, M. A., Snyder, D. W., Redwing, J. M.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
106
Year:
2009
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3160331
File:
PDF, 813 KB
english, 2009
Conversion to is in progress
Conversion to is failed