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Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures
Ait Aissa, K., Achour, A., Camus, J., Le Brizoual, L., Jouan, P.-Y., Djouadi, M.-A.Volume:
550
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2013.11.073
Date:
January, 2014
File:
PDF, 987 KB
english, 2014