Silicon protected with atomic layer deposited TiO2: conducting versus tunnelling through TiO2
Seger, Brian, Tilley, S. David, Pedersen, Thomas, Vesborg, Peter C. K., Hansen, Ole, Grätzel, Michael, Chorkendorff, IbVolume:
1
Year:
2013
Language:
english
Journal:
Journal of Materials Chemistry A
DOI:
10.1039/C3TA12309J
File:
PDF, 762 KB
english, 2013