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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Overlay performance on tungsten CMP layers using the ATHENA alignment system
Rivera, Giovanni, Rozzoni, Laura, Castellana, Elisabetta, Miraglia, Guido, Lam, Pui L., Plauth, Johannes, Dunbar, Allan, Phillips, Merritt, Sullivan, Neal T.Volume:
3998
Year:
2000
Language:
english
DOI:
10.1117/12.386498
File:
PDF, 3.46 MB
english, 2000