Low-Pressure Chemical Vapor Deposition of Cu−Pd Films: ...

Chemistry of Materials 1997 / 12 Vol. 9; Iss. 12

Low-Pressure Chemical Vapor Deposition of Cu−Pd Films:  Alloy Growth Kinetics

Bhaskaran, Vijay, Atanasova, Paolina, Hampden-Smith, Mark J., Kodas, Toivo T.
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Volume:
9
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm970159j
Date:
December, 1997
File:
PDF, 239 KB
english, 1997
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