Oxygen pressure manipulations on the metal–insulator transition characteristics of highly (0 1 1)-oriented vanadium dioxide films grown by magnetron sputtering
Yu, Qian, Li, Wenwu, Liang, Jiran, Duan, Zhihua, Hu, Zhigao, Liu, Jian, Chen, Hongda, Chu, JunhaoVolume:
46
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/46/5/055310
Date:
February, 2013
File:
PDF, 986 KB
english, 2013