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Structural and electrical properties of sputtering power and gas pressure on Ti-dope In2O3 transparent conductive films by RF magnetron sputtering
Chaoumead, Accarat, Joo, Bong-Hyun, Kwak, Dong-Joo, Sung, Youl-MoonVolume:
275
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2012.12.133
Date:
June, 2013
File:
PDF, 1.35 MB
english, 2013