Silicon nanocrystal growth in the long diffusion length regime using high density plasma chemical vapour deposited silicon rich oxides
Carroll, M S, Brewer, L, Verley, J C, Banks, J, Sheng, J J, Pan, W, Dunn, RVolume:
18
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/18/31/315707
Date:
August, 2007
File:
PDF, 879 KB
english, 2007