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Plasma potential mapping of high power impulse magnetron sputtering discharges
Rauch, Albert, Mendelsberg, Rueben J., Sanders, Jason M., Anders, AndreÌVolume:
111
Year:
2012
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3700242
File:
PDF, 8.50 MB
english, 2012