Physical properties of RF sputtered ITO thin films and...

Journal of Physics D Applied Physics 2006 / 01 Vol. 39; Iss. 1

Physical properties of RF sputtered ITO thin films and annealing effect

Kerkache, L, Layadi, A, Dogheche, E, Rémiens, D
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Volume:
39
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/39/1/027
Date:
January, 2006
File:
PDF, 1.15 MB
english, 2006
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