![](/img/cover-not-exists.png)
Electron beam induced chemical dry etching and imaging in gaseous NH 3 environments
Lobo, Charlene J, Martin, Aiden, Phillips, Matthew R, Toth, MilosVolume:
23
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/23/37/375302
Date:
September, 2012
File:
PDF, 690 KB
english, 2012