Magnetic field strength influence on the reactive magnetron...

Journal of Physics D Applied Physics 2013 / 08 Vol. 46; Iss. 33

Magnetic field strength influence on the reactive magnetron sputter deposition of Ta 2 O 5

Hollerweger, R, Holec, D, Paulitsch, J, Rachbauer, R, Polcik, P, Mayrhofer, P H
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Volume:
46
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/46/33/335203
Date:
August, 2013
File:
PDF, 739 KB
english, 2013
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