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A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering
Vlček, J, Burcalová, KVolume:
19
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/19/6/065010
Date:
December, 2010
File:
PDF, 734 KB
english, 2010