Sputter yield amplification by tungsten doping of Al 2 O 3 employing reactive serial co-sputtering: process characteristics and resulting film properties
Austgen, M, Koehl, D, Zalden, P, Kubart, T, Nyberg, T, Pflug, A, Siemers, M, Berg, S, Wuttig, MVolume:
44
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/44/34/345501
Date:
August, 2011
File:
PDF, 747 KB
english, 2011