Mechanism of Silicon Carbide Film Deposition at Room...

Mechanism of Silicon Carbide Film Deposition at Room Temperature Using Monomethylsilane Gas

Habuka, Hitoshi, Ando, Yusuke
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
158
Year:
2011
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3545071
File:
PDF, 2.29 MB
english, 2011
Conversion to is in progress
Conversion to is failed