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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Optical Microlithography XXIV - Simulation-based scanner tuning using FlexRay capability and scatterometry
Bubke, Karsten, Ruhm, Matthias, Aldana, Rafael, Niehoff, Martin, Xie, Xu, Ghan, Justin, van Adrichem, Paul, Bald, Holger, Luehrmann, Paul, Roling, Stefan, Seltmann, Rolf, Dusa, Mircea V.Volume:
7973
Year:
2011
Language:
english
DOI:
10.1117/12.890501
File:
PDF, 2.33 MB
english, 2011