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Multilevel diffractive elements in SiO2 by electron beam lithography and proportional etching with analogue negative resist
Laakkonen, Pasi, Lautanen, Jari, Kettunen, Ville, Turunen, Jari, Schirmer, MatthiasVolume:
46
Language:
english
Journal:
Journal of Modern Optics
DOI:
10.1080/09500349908231336
Date:
July, 1999
File:
PDF, 1.02 MB
english, 1999