Formation of Conducting and Insulating Layered Structures in Si by Ion Implantation: Process Control Using FTIR Spectroscopy
Katsidis, C. C., Siapkas, D. I., Robinson, A. K., Hemment, P. L. F.Volume:
148
Year:
2001
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1413994
File:
PDF, 266 KB
english, 2001