SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Optimization of BSE-detector for e-beam direct write lithography
Alves, H., Hahmann, P., Slodowski, M., Frase, C. G., Gnieser, D., Johnsen, K.-P., Bosse, H., Schellenberg, Frank M., La Fontaine, Bruno M.Volume:
7271
Year:
2009
Language:
english
DOI:
10.1117/12.814156
File:
PDF, 407 KB
english, 2009