Direct nanoimprint lithography of Al 2...

Nanotechnology 2012 / 08 Vol. 23; Iss. 31

Direct nanoimprint lithography of Al 2 O 3 using a chelated monomer-based precursor

Ganesan, Ramakrishnan, Dinachali, Saman Safari, Lim, Su Hui, Saifullah, M S M, Chong, Wee Tit, Lim, Andrew H H, Yong, Jin Jie, Thian, Eng San, He, Chaobin, Low, Hong Yee
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Volume:
23
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/23/31/315304
Date:
August, 2012
File:
PDF, 2.55 MB
english, 2012
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