Effect of low RF bias potential on AlN films obtained by Microwave Plasma Enhanced Chemical Vapor Deposition
Sánchez, G., Tristant, P., Dublanche-Tixier, C., Tétard, F., Bologna Alles, A.Volume:
256
Language:
english
Journal:
Surface and Coatings Technology
DOI:
10.1016/j.surfcoat.2013.10.067
Date:
October, 2014
File:
PDF, 1.20 MB
english, 2014