TiN Deposition and Process Diagnostics using Remote Plasma...

Japanese Journal of Applied Physics 2013 / 08 Vol. 52; Iss. 8R

TiN Deposition and Process Diagnostics using Remote Plasma Sputtering

Yang, Wonkyun, Kim, Gi-Taek, Lee, Seunghun, Kim, Do-Geun, Kim, Jong-Kuk
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Volume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.085501
Date:
August, 2013
File:
PDF, 974 KB
english, 2013
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