Development of a hollow cathode plasma source for microcrystalline silicon thin films deposition
Dimitrakellis, P, Amanatides, E, Mataras, D, Rapakoulias, D EVolume:
275
Language:
english
Journal:
Journal of Physics: Conference Series
DOI:
10.1088/1742-6596/275/1/012014
Date:
January, 2011
File:
PDF, 369 KB
english, 2011