SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI - Application of deep x-ray lithography for fabrication of polymer regular membranes with submicrometer pores
Kulipanov, G. N., Makarov, Oleg A., Mezentseva, Lubov A., Mishnev, S. I., Nazmov, Vladimir, Pindyurin, Valery F., Skrinsky, A. N., Artamonova, L. D., Cherkov, G. A., Gashtold, V. N., Prokopenko, V. S.Volume:
2723
Year:
1996
Language:
english
DOI:
10.1117/12.240478
File:
PDF, 561 KB
english, 1996