Measurements of time resolved rf impedance of a pulsed inductively coupled Ar plasma
Chang, Chia-Hao, Leou, Keh-Chyang, Chen, Chin-Hsiung, Lin, ChaungVolume:
15
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/15/3/007
Date:
August, 2006
File:
PDF, 501 KB
english, 2006