Characterization of inductively coupled RF plasmas for...

Journal of Physics Conference Series 2012 / 08 Vol. 379

Characterization of inductively coupled RF plasmas for plasma-assisted mist CVD of ZnO films

Takenaka, Kosuke, Okumura, Yusuke, Setsuhara, Yuichi
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Volume:
379
Language:
english
Journal:
Journal of Physics: Conference Series
DOI:
10.1088/1742-6596/379/1/012031
Date:
August, 2012
File:
PDF, 484 KB
english, 2012
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