Ga out-diffusion in rapid-thermal-processed GaAs with SiO2...

Journal of Applied Physics 1991 Vol. 69; Iss. 6

Ga out-diffusion in rapid-thermal-processed GaAs with SiO2 encapsulants

Katayama, Masayuki, Tokuda, Yutaka, Inoue, Yajiro, Usami, Akira, Wada, Takao
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Volume:
69
Year:
1991
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.348496
File:
PDF, 742 KB
english, 1991
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