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Microstructural modifications induced by rapid thermal annealing in plasma deposited SiO[sub x]N[sub y]H[sub z] films
del Prado, A., San AndreÌs, E., MaÌrtil, I., GonzaÌlez-DıÌaz, G., Bravo, D., LoÌpez, F. J., FernaÌndez, M., MartıÌnez, F. L.Volume:
94
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1586979
File:
PDF, 326 KB
english, 2003