SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Inverse scattering approach to SEM linewidth measurements
Davidson, Mark P., Vladar, Andras E., Singh, BhanwarVolume:
3677
Year:
1999
Language:
english
DOI:
10.1117/12.350850
File:
PDF, 1.12 MB
english, 1999