Towards forming-free resistive switching in oxygen engineered HfO2−x
Sharath, S. U., Bertaud, T., Kurian, J., Hildebrandt, E., Walczyk, C., Calka, P., Zaumseil, P., Sowinska, M., Walczyk, D., Gloskovskii, A., Schroeder, T., Alff, L.Volume:
104
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.4864653
Date:
February, 2014
File:
PDF, 1.16 MB
english, 2014