On the mechanism of CH3 radical formation in hot filament...

Diamond and Related Materials 2001 / 3 Vol. 10; Iss. 3-7

On the mechanism of CH3 radical formation in hot filament activated CH4/H2 and C2H2/H2 gas mixtures

Smith, J.A., Cameron, E., Ashfold, M.N.R., Mankelevich, Y.A., Suetin, N.V.
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Volume:
10
Language:
english
Journal:
Diamond and Related Materials
DOI:
10.1016/S0925-9635(00)00443-X
Date:
March, 2001
File:
PDF, 127 KB
english, 2001
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