Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
Burke, Micheal, Blake, Alan, Povey, Ian M., Schmidt, Michael, Petkov, Nikolay, Carolan, Patrick, Quinn, Aidan J.Volume:
32
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4868215
Date:
May, 2014
File:
PDF, 1.17 MB
english, 2014