Electrical and optical properties of TiO 2 thin films prepared by plasma-enhanced atomic layer deposition
Dang, Van-Son, Parala, Harish, Kim, Jin Hyun, Xu, Ke, Srinivasan, Nagendra B., Edengeiser, Eugen, Havenith, Martina, Wieck, Andreas D., de los Arcos, Teresa, Fischer, Roland. A., Devi, AnjanaVolume:
211
Language:
english
Journal:
physica status solidi (a)
DOI:
10.1002/pssa.201330115
Date:
February, 2014
File:
PDF, 1.04 MB
english, 2014