Characterization of polycrystalline...

Electronic Materials Letters 2013 / 10 Vol. 9; Iss. 1 Suppleme

Characterization of polycrystalline silicon-oxide-nitride-oxide-silicon devices on a SiO2or Si3N4buffer layer

Lee, Sang-Youl, Oh, Jae-Sub, Yang, Seung-Dong, Yun, Ho-Jin, Jeong, Kwang-Seok, Kim, Yu-Mi, Lee, Hi-Deok, Lee, Ga-Won
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
9
Language:
english
Journal:
Electronic Materials Letters
DOI:
10.1007/s13391-013-3176-1
Date:
October, 2013
File:
PDF, 520 KB
english, 2013
Conversion to is in progress
Conversion to is failed