Measurements of CD and sidewall profile of EUV photomask...

Measurement Science and Technology 2014 / 04 Vol. 25; Iss. 4

Measurements of CD and sidewall profile of EUV photomask structures using CD-AFM and tilting-AFM

Dai, Gaoliang, Hahm, Kai, Scholze, Frank, Henn, Mark-Alexander, Gross, Hermann, Fluegge, Jens, Bosse, Harald
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Volume:
25
Language:
english
Journal:
Measurement Science and Technology
DOI:
10.1088/0957-0233/25/4/044002
Date:
April, 2014
File:
PDF, 2.35 MB
english, 2014
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