A novel microwave plasma reactor with a unique structure for chemical vapor deposition of diamond films
Su, J.J., Li, Y.F., Li, X.L., Yao, P.L., Liu, Y.Q., Ding, M.H., Tang, W.Z.Volume:
42
Language:
english
Journal:
Diamond and Related Materials
DOI:
10.1016/j.diamond.2013.12.001
Date:
February, 2014
File:
PDF, 823 KB
english, 2014