Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2001 Vol. 19; Iss. 1
![](/img/cover-not-exists.png)
In situ physical vapor deposition of ionized Ti and TiN thin films using hollow cathode magnetron plasma source
D’Couto, G. C., Tkach, G., Ashtiani, K. A., Hartsough, L., Kim, E., Mulpuri, R., Lee, D. B., Levy, K., Fissel, M., Choi, S., Choi, S.-M., Lee, H.-D., Kang, H.-K.Volume:
19
Year:
2001
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.1339012
File:
PDF, 526 KB
english, 2001