HBr/O2 plasma treatment followed by a bake for photoresist...

Journal of Applied Physics 2014 / 02 Vol. 115; Iss. 7

HBr/O2 plasma treatment followed by a bake for photoresist linewidth roughness smoothing

Fouchier, M., Pargon, E.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
115
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4865799
Date:
February, 2014
File:
PDF, 2.97 MB
english, 2014
Conversion to is in progress
Conversion to is failed