High-k ZrO2 dielectric thin films on GaAs semiconductor with reduced regrowth of native oxides by atomic layer deposition
Konda, R.B., White, C., Smak, J., Mundle, R., Bahoura, M., Pradhan, A.K.Volume:
583
Language:
english
Journal:
Chemical Physics Letters
DOI:
10.1016/j.cplett.2013.08.012
Date:
September, 2013
File:
PDF, 2.09 MB
english, 2013