Dielectric properties of amorphous hydrogenated silicon...

Journal of Applied Physics 2003 Vol. 93; Iss. 7

Dielectric properties of amorphous hydrogenated silicon carbide thin films grown by plasma-enhanced chemical vapor deposition

Brassard, D., El Khakani, M. A.
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Volume:
93
Year:
2003
Language:
english
DOI:
10.1063/1.1555676
File:
PDF, 246 KB
english, 2003
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