Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2001 Vol. 19; Iss. 5
![](/img/cover-not-exists.png)
Impurity-free intermixing of GaAs/AlGaAs quantum wells using SiO[sub x] capping: Effect of nitrous oxide flow rate
Deenapanray, Prakash N. K., Jagadish, C.Volume:
19
Year:
2001
Language:
english
DOI:
10.1116/1.1406937
File:
PDF, 284 KB
english, 2001