Properties of HfLaO MOS capacitor deposited on SOI with...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2014 Vol. 32; Iss. 1

Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition

Wan, Wenyan, Cheng, Xinhong, Cao, Duo, Zheng, Li, Xu, Dawei, Wang, Zhongjian, Xia, Chao, Shen, Lingyan, Yu, Yuehui, Shen, DaShen
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Volume:
32
Year:
2014
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4850175
File:
PDF, 1.21 MB
english, 2014
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