Stimulated oxygen impurity gettering under ultra-shallow...

Semiconductor Science and Technology 2014 / 05 Vol. 29; Iss. 5

Stimulated oxygen impurity gettering under ultra-shallow junction formation in silicon

Oberemok, O, Kladko, V, Litovchenko, V, Romanyuk, B, Popov, V, Melnik, V, Sarikov, A, Gudymenko, O, Vanhellemont, J
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Volume:
29
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/29/5/055008
Date:
May, 2014
File:
PDF, 1.06 MB
english, 2014
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