![](/img/cover-not-exists.png)
Formation of amorphous Yb2O3/crystalline ZrTiO4 gate stack and its application in n-MOSFET with sub-nm EOT
Lin, Chia-Chun, Wu, Yung-Hsien, Wu, Chao-Yi, Lee, Ching-WeiVolume:
299
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2014.01.182
Date:
April, 2014
File:
PDF, 1.46 MB
english, 2014